NF3

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At room temperature, it is a colorless, odorless and stable, also is a strong oxidant. It is a excellent plasma etching gas in microelectronics industry, can be split into active fluorine ions during ion etching. It has excellent etching rate and selectivity, usually applied in semiconductor / LCD process.

Description

Product Specification
PURITY PACKAGE VALVE CONTENT
NF3 4N TT DISS640 4000